Career history of Charles M. McKenna
Former positions of Charles M. McKenna
| Companies | Position | Start | End |
|---|---|---|---|
Ibis Technology Corp.
 Ibis Technology Corp. SemiconductorsElectronic Technology Ibis Technology Corp. develops, manufactures and markets SIMOX-SOI implantation equipment for the worldwide semiconductor industry. SIMOX creates an insulating oxide barrier below the top surface of a silicon wafer through implantation and annealing. The company's proprietary oxygen implanters produce SIMOX-SOI wafers by implanting oxygen atoms just below the surface of a silicon wafer to create a very thin layer of silicon dioxide between the thin operating region of the transistor at the surface and the underlying silicon wafer itself. It was founded in October 1987. | President | 2005-04-30 | 2007-11-29 |
| AZENTA, INC. | Chief Tech/Sci/R&D Officer | 1999-12-31 | 2002-12-31 |
Statistics
International
| United States | 3 |
Operational
| Chief Tech/Sci/R&D Officer | 1 |
| President | 1 |
Sectoral
| Health Services | 2 |
| Electronic Technology | 2 |
Positions held
Active
Inactive
Listed companies
Private companies
Linked companies
| Listed companies | 1 |
|---|---|
| AZENTA, INC. | Health Services |
| Private companies | 1 |
|---|---|
Ibis Technology Corp.
Ibis Technology Corp. SemiconductorsElectronic Technology Ibis Technology Corp. develops, manufactures and markets SIMOX-SOI implantation equipment for the worldwide semiconductor industry. SIMOX creates an insulating oxide barrier below the top surface of a silicon wafer through implantation and annealing. The company's proprietary oxygen implanters produce SIMOX-SOI wafers by implanting oxygen atoms just below the surface of a silicon wafer to create a very thin layer of silicon dioxide between the thin operating region of the transistor at the surface and the underlying silicon wafer itself. It was founded in October 1987. | Electronic Technology |
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